The 4th Generation High Performance Metal Analyzer
CMOS-based, spark discharge, metal detection
Ultra-low limits of detection
High integration, reliability, stability
Lowing operating cost and easy maintenance
Vacuum optical chamber and low argon consumption
Argon jet technology to optimize small sample analysis
Standardized parameter modification
Maximum 30+ elements
High nitrogen (N) analysis 0.03-0.9%
Summary:
W5 Optical Emission Spectrometer bring in the advanced technology from Europe. It is the 4th generation Arc/Spark-OES with high performance lowing operating cost for metal analysis and this is the latest research and development of detection equipment. The overall optical design has been enhanced, and with improvements of CMOS technology used to further improve the performance of the W5 while retaining the major benefit of earlier units. The CMOS spectrometer is not only contain the full spectrum characteristics of CCD spectrometer but also the extremely low detection limit for non-metallic elements such as C, S, P, B, As, N etc. The operation is simple and easy to learn. The test result is stable and accuracy. It is a good choice of all common metals for incoming and outgoing product quality control.
Application:
W5 Optical Emission Spectrometer (spark OES) is used for applications in metal elemental analysis, trace element analysis for science and industry like Metallurgy, Foundry, Mechanical Engineering, Scientific Research, Product Inspection, Automobile, Petrochemical Engineering, Shipbuilding, Electrics, Aerospace, Nuclear Power, Metallic and Nonferrous Metallic Smelting, Processing and Recycling.
Steel Plants Where needs high accuracy or elements like C, N, Cr, S, P etc.
Testing Laboratories: Commercial testing laboratories, Universities and colleges
Pure metal applications purity Al, Pb, Zn, Cu etc. – most industrial users
Regulatory compliance Very low LODs to control Pb, Cd, As etc.
Foundries which need a quick analysis near the furnace
Manufacturing Facilities
Warehouse material identification
Base: Fe, Cu, Al, Ni, Co, Mg, Ti, Zn, Pb, Sn, Ag, Mn, Cr etc
Features :
1.Superior Performance Optical System, Intelligent DigitalSpark Source
2.It can detect elements including that C, P, S, N and it is suitable for a variety of metal base.
3.The design of argon gas circuit is reasonable to make argon washing’s time is shorten when the sample excitation.
4.The rate of analysis is fast, all elements in the channel can be tested within 20s.
5.Solid absorption trap can prevent oil and gas from polluting the light chamber and improve its stability.
6.Standardized parameter modification.
7.Control sample correction function.
8.The core device are all original imported in order to promise the products’ quality.
Parameter:
|
Item |
Index |
|
Optical system |
|
|
Optical structure |
The Paschen Runge construction full vacuum type optics system |
|
Room temperature |
35℃±0.5℃ |
|
Wavelength range |
130-800nm |
|
Focal length |
400mm |
|
Grating line |
2400m1/mm |
|
First order spectral line dispersion rare |
1.2nm/mm |
|
Detector |
Multi block high performance linear CMOS array |
|
Average resolution ratio |
10pm/pixel |
|
Spark table |
|
|
Gas |
Argon gas (99.999%) |
|
Argon flow rate |
When spark: 3-5L/min Standby time: no need for standby traffic |
|
Electrode |
Tungsten electrode technology |
|
Purge |
Automatic purge function |
|
Make up |
Thermal deformation self-compensation design |
|
Analyze the gap |
Sample stage:3.4 mm |
|
Spark source |
|
|
Type |
HEPS |
|
Frequency |
100-1000HZ |
|
Discharge current |
1-400A |
|
Special technology |
Optimization of discharge parameters design |
|
Pre -combustion |
High-energy pre-combustion technology |
|
Processor |
High end ARM, high-speed data synchronization acquisition and processing |
|
Data collection system |
|
|
Interface |
Ethernet data transmission based on DM9000A |
|
Power |
220VAC 50/60Hz(Customized) |
|
Others |
|
|
Base |
Fe, Cu, Al, Ni, Co, Mg, Ti, Zn, Pb, Sn, Ag, Mn, Cr etc |
|
Power consumption |
Maximum:750W standby:40W |
|
Working temperature |
10-35℃（temperature ≥5°C） |
|
Working humidity |
20-85% |
|
Dimension |
860mm(L)*680mm(W)*438mm(H) |
|
Weight |
About 100Kg |
The 4th Generation High Performance Metal Analyzer
CMOS-based, spark discharge, metal detection
Ultra-low limits of detection
High integration, reliability, stability
Lowing operating cost and easy maintenance
Vacuum optical chamber and low argon consumption
Argon jet technology to optimize small sample analysis
Standardized parameter modification
Maximum 30+ elements
High nitrogen (N) analysis 0.03-0.9%
The 4th Generation High Performance Metal Analyzer
CMOS-based, spark discharge, metal detection
Ultra-low limits of detection
High integration, reliability, stability
Lowing operating cost and easy maintenance
Vacuum optical chamber and low argon consumption
Argon jet technology to optimize small sample analysis
Standardized parameter modification
Maximum 30+ elements
High nitrogen (N) analysis 0.03-0.9%
The 4th Generation High Performance Metal Analyzer
CMOS-based, spark discharge, metal detection
Ultra-low limits of detection
High integration, reliability, stability
Lowing operating cost and easy maintenance
Vacuum optical chamber and low argon consumption
Argon jet technology to optimize small sample analysis
Standardized parameter modification
Maximum 30+ elements
High nitrogen (N) analysis 0.03-0.9%
The 4th Generation High Performance Metal Analyzer
CMOS-based, spark discharge, metal detection
Ultra-low limits of detection
High integration, reliability, stability
Lowing operating cost and easy maintenance
Vacuum optical chamber and low argon consumption
Argon jet technology to optimize small sample analysis
Standardized parameter modification
Maximum 30+ elements
High nitrogen (N) analysis 0.03-0.9%
The 4th Generation High Performance Metal Analyzer
CMOS-based, spark discharge, metal detection
Ultra-low limits of detection
High integration, reliability, stability
Lowing operating cost and easy maintenance
Vacuum optical chamber and low argon consumption
Argon jet technology to optimize small sample analysis
Standardized parameter modification
Maximum 30+ elements
High nitrogen (N) analysis 0.03-0.9%
The 4th Generation High Performance Metal Analyzer
CMOS-based, spark discharge, metal detection
Ultra-low limits of detection
High integration, reliability, stability
Lowing operating cost and easy maintenance
Vacuum optical chamber and low argon consumption
Argon jet technology to optimize small sample analysis
Standardized parameter modification
Maximum 30+ elements
High nitrogen (N) analysis 0.03-0.9%
The 4th Generation High Performance Metal Analyzer
CMOS-based, spark discharge, metal detection
Ultra-low limits of detection
High integration, reliability, stability
Lowing operating cost and easy maintenance
Vacuum optical chamber and low argon consumption
Argon jet technology to optimize small sample analysis
Standardized parameter modification
Maximum 30+ elements
High nitrogen (N) analysis 0.03-0.9%
Simultaneous ICP-OES for elemental analysis of liquids
Wavelength range:195-800nm
For 70 trace elements and macroelements
Analyze up to 600 samples per day
Low operating costs
Intuitive operation
Ultra-low limits of detection
Ultra-high speed of measurement
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