SUS Certified Reference Materials

1 series aluminum CRMs

2 series aluminum CRMs

3 series aluminum CRMs

4 series aluminum CRMs

5 series aluminum CRMs

6 series aluminum CRMs

7 series aluminum CRMs

8 series aluminum CRMs

Fe-based Certified Reference Materials

Ni-Based Certified Reference Materials

Cu-Based Certified Reference Materials

Al-Based Certified Reference Materials

Mg-Based Certified Reference Materials

Sn-Based Certified Reference Materials

Pb-Based Certified Reference Materials

Fe-based Certified Reference Materials

Ni-Based Certified Reference Materials

Cu-Based Certified Reference Materials

Al-Based Certified Reference Materials

Mg-Based Certified Reference Materials

Sn-Based Certified Reference Materials

Pb-Based Certified Reference Materials

Fe-based Certified Reference Materials

Ni-Based Certified Reference Materials

Cu-Based Certified Reference Materials

Al-Based Certified Reference Materials

Mg-Based Certified Reference Materials

Sn-Based Certified Reference Materials

Pb-Based Certified Reference Materials

Fe-based Certified Reference Materials

Ni-Based Certified Reference Materials

Cu-Based Certified Reference Materials

Al-Based Certified Reference Materials

Mg-Based Certified Reference Materials

Sn-Based Certified Reference Materials

Pb-Based Certified Reference Materials

CMOS-based, spark discharge, optical emission spectrometer

Multi-bases, full spectrum analysis for utmost elemental flexibility

Ultra-low limits of detection 

Wavelength range:130nm-800nm, maximum 30+ elements

Long-term stability and repeatability

Excellent vertical optical emission spectroscopy

Vacuum gauge to monitor the vacuum status in real time

Ultra-low carbon, low nitrogen analysis

Small sample analysis applications

Because polishing is such a critical step in sample preparation, it’s important to choose a high quality polishing cloth. Our metallographic polishing cloth pads are thoroughly testedto provide a complete solution that delivers reliable results for each sample processed.

The 4th Generation High Performance Metal Analyzer

CMOS-based, spark discharge, metal detection

Ultra-low limits of detection

High integration, reliability, stability

Lowing operating cost and easy maintenance

Vacuum optical chamber and low argon consumption

Argon jet technology to optimize small sample analysis

Standardized parameter modification

Maximum 30+ elements

High nitrogen (N) analysis 0.03-0.9%