Vacuum Optical Emission Spectrometer for Metallurgical Structure Analysis

Summary:

W4 Spectrometer is most suitable instrument for the determination of various elements in different matrices (Fe, Cu, Al, Ni, Co, Mg, Ti, Zn, Pb, Sn, Ag, etc ). It is an economical and easy solution to quick analysis near the furnace, metal processing quality control and incoming material inspection, research laboratories and metal grade identification

This also gives the user a truly economical spectrometer that’s both easy to use and easy to space saved. The optical system uses a CMOS detector with a spectral range covering all typical materials. It can accurately and reliably analyze from low-level elements to high-content elements. The compact structure design allows users to combine production and quality control more closely

Applications:

Steel plants where needs are at around 100 PPM levels or elements like C, Cr, S, P etc.

Rolling mills, foundries, workshops: Rapid analysis; test several 100s of samples daily

Alloy manufacturers: Any number of bases / matrices; highly stable and precise

Testing Laboratories: Commercial testing laboratories, Universities and colleges

Medium-sized industries: Extremely rugged and economical; low cost / analysis

Foundries which need a quick analysis near the furnace

Warehouse material identification

Base: Fe, Cu, Al, Ni, Co, Mg, Ti, Zn, Pb, Sn, Ag, etc

Features:

Precise reliable, fast, versatile and affordable

Compact designed desktop unit

Energy saving, standby power 50VA,

Achieves more accurate data by modifying standardized parameter                                

High resolution CMOS detector can achieve full spectrum analysis.

Full wavelength coverage, customized factory calibration, adding new element without further hardware configuration.

Wavelength range 165nm~589nm(extendable), spectral lines can cover all important elements

Spectrometer temperature control ensuring high precision and stability

Customized reports and quick diagnosis software

Programmable digitalized spark source, generating optimized discharge waveform for different bases.

Advanced excitation protection and diagnostic system ensuring operating safety

Argon purge control protecting entrance lens form contaminating, minimizing maintenance

Professional data capture, improved accuracy by reducing background interference

Global factory calibration with interference correction

Technology support and software update for free.