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M4 OES Optical Emission Spectrometer

Low total cost of ownership

Vacuum-free optics with fast stabilization

Unmatched analytical performance and reliability

Excellent long-term stability

Easy to use with full PC control

Compact design, small size.

Maximum 20 elements

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Summary:

The M4 Optical Emission Spectrometer adopt international standard design and manufacturing process technology, full digital combines with internet technology, and using high resolution CMOS detector, the precisely designed argon purge system to guarantee instruments with higher performance, lower cost and extremely competitive price.

M4 Spectrometer is most suitable instrument for the determination of various elements in different matrices (Fe, Al, Mg). It is an ideal solution to metal processing control and chemical analysis, metal material quality analysis and research laboratories. It is cost-effective and does not require a vacuum system. If the customer want high cost effective and the test is infrequent, the M4 OES will be a good choice.

 

Applications:

Testing Laboratories: Commercial testing laboratories, Universities and colleges

Alloy manufacturers: metal processing control and chemical analysis

Medium-sized industries: Extremely rugged and economical; low cost / analysis

Foundries which need a quick analysis near the furnace

Manufacturing Facilities

Warehouse material identification

Base: Fe, Al, Mg

 

Features:

Precise reliable, fast, versatile and affordable

Compact designed desktop unit

Energy saving, standby power 50VA,

The light chamber filled with argon in place of vacuum system .                                        

High resolution CMOS detector can achieve full spectrum analysis.

Full wavelength coverage, customized factory calibration, adding new element without further hardware configuration.

Wavelength range 165nm~580nm(extendable), spectral lines can cover all important elements

Highly sensitive UV detection with the precisely argon purge system,

Spectrometer temperature control ensuring high precision and stability

Programmable digitalized spark source, generating optimized discharge waveform for different bases.

Advanced excitation protection and diagnostic system ensuring operating safety

Argon purge control protecting entrance lens form contaminating, minimizing maintenance

Professional data capture, improved accuracy by reducing background interference

Global factory calibration with interference correction

Technology support and software update for free.

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