Low total cost of ownership
Vacuum-free optics with fast stabilization
Unmatched analytical performance and reliability
Excellent long-term stability
Easy to use with full PC control
Compact design, small size.
Maximum 20 elements
Summary:
The M4 Optical Emission Spectrometer adopt international standard design and manufacturing process technology, full digital combines with internet technology, and using high resolution CMOS detector, the precisely designed argon purge system to guarantee instruments with higher performance, lower cost and extremely competitive price.
M4 Spectrometer is most suitable instrument for the determination of various elements in different matrices (Fe, Al, Mg). It is an ideal solution to metal processing control and chemical analysis, metal material quality analysis and research laboratories. It is cost-effective and does not require a vacuum system. If the customer want high cost effective and the test is infrequent, the M4 OES will be a good choice.
Applications:
Testing Laboratories: Commercial testing laboratories, Universities and colleges
Alloy manufacturers: metal processing control and chemical analysis
Medium-sized industries: Extremely rugged and economical; low cost / analysis
Foundries which need a quick analysis near the furnace
Manufacturing Facilities
Warehouse material identification
Base: Fe, Al, Mg
Features:
Precise reliable, fast, versatile and affordable
Compact designed desktop unit
Energy saving, standby power 50VA,
The light chamber filled with argon in place of vacuum system .
High resolution CMOS detector can achieve full spectrum analysis.
Full wavelength coverage, customized factory calibration, adding new element without further hardware configuration.
Wavelength range 165nm~580nm(extendable), spectral lines can cover all important elements
Highly sensitive UV detection with the precisely argon purge system,
Spectrometer temperature control ensuring high precision and stability
Programmable digitalized spark source, generating optimized discharge waveform for different bases.
Advanced excitation protection and diagnostic system ensuring operating safety
Argon purge control protecting entrance lens form contaminating, minimizing maintenance
Professional data capture, improved accuracy by reducing background interference
Global factory calibration with interference correction
Technology support and software update for free.
Low total cost of ownership
Vacuum-free optics with fast stabilization
Unmatched analytical performance and reliability
Excellent long-term stability
Easy to use with full PC control
Compact design, small size.
Maximum 20 elements
The core purpose of desiccant is to absorb moisture or humidity in the environment and maintain a low humidity state in a specific space or object, thereby preventing the items from getting damp, moldy, rusting or deteriorating.
Cl, K, Si, Mg, Al, S, P, Ca, Fe in cement and Limestone
Upper-illuminated optical path structure
High precision, good stability, simple operation
Test results close to wet chemical method testing
Only a few minutes to analyze dozens of elements in a sample
The 4th Generation High Performance Metal Analyzer
CMOS-based, spark discharge, metal detection
Ultra-low limits of detection
High integration, reliability, stability
Lowing operating cost and easy maintenance
Vacuum optical chamber and low argon consumption
Argon jet technology to optimize small sample analysis
Standardized parameter modification
Maximum 30+ elements
High nitrogen (N) analysis 0.03-0.9%
High resolution CMOS readout system
Low total cost of ownership
Vacuum optics enabling fast stabilization
Excellent long-term stability
Intelligent design, Modular design
Ferrous and non-ferrous applications
Easy to use with full PC control
Friendly user interface
Flexible, reliable and safety on-site analysis
Anytime, anywhere, on-site inspection
Positive Material Identification (PMI)
Light-weight to be about 20Kg
High accuracy and stability
Suitable for analysis task in different conditions
Compact rugged and with high-performance optics
Intelligent, multi-modal mobile design
High resolution CMOS readout system
Low total cost of ownership
Vacuum optics enabling fast stabilization
Excellent long-term stability
Intelligent design, Modular design
Ferrous and non-ferrous applications
Easy to use with full PC control
Friendly user interface
Metallographic hot mosaics are suitable for different types of mosaics to do sample mosaics, in order to test the hardness of small workpieces and observe the metallographic structure. The Mosaic powder can be prepared by the Mosaic machine sample preparation for 8-15 minutes, the heat preservation is 140-180℃, the Mosaic pressure is 30±3MPa, and the sample preparation can be completed.
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