High resolution CMOS direct read out system
Save space with the smallest dimension and weight
High cost performance with excellent performance
Good determination of the different element in the various matrices
Operate a fast and accurate quantitative analysis
Argon flushed with minimal argon consumption
Complete automatic analysis software with diagnostic function
Summary:
M5 Optical Emission Spectrometer adopts international standards design and manufacturing process technology, full digital and internet technology combined with high resolution CMOS detector and precision engineered argon purge system, and make the instrument is extremely high performance, extremely low cost, and competitively priced.
M5 Spectrometer is most suitable instrument for the determination of various elements in different matrices (Fe, Al, Cu). It provides a perfect solution for fast and accurate quantitative analysis before furnace, quality control of metal materials, research and development of research institutes. This also gives the user a truly portable spectrometer that’s both easy to use and easy to space saved.
Applications:
Testing Laboratories: Commercial testing laboratories, universities and colleges
Alloy manufacturers: metal processing control and chemical analysis
Medium-sized industries: Extremely rugged and economical; low cost / analysis
Foundries which need a quick analysis near the furnace
Manufacturing Facilities
Warehouse material identification
Base: Fe, Al, Cu
Features:
Precise reliable, fast, versatile and affordable
Compact designed desktop unit
Energy saving, standby power 50VA,
The light chamber filled with argon in place of vacuum system .
High resolution CMOS detector can achieve full spectrum analysis.
Full wavelength coverage, customized factory calibration, adding new element without further hardware configuration.
Wavelength range 165nm~580nm(extendable), spectral lines can cover all important elements
Highly sensitive UV detection with the precisely argon purge system,
Spectrometer temperature control ensuring high precision and stability
Programmable digitalized spark source, generating optimized discharge waveform for different bases.
Advanced excitation protection and diagnostic system ensuring operating safety
Argon purge control protecting entrance lens form contaminating, minimizing maintenance
Professional data capture, improved accuracy by reducing background interference
Global factory calibration with interference correction
Technology support and software update for free.
Parameter:
|
Item |
Index |
|
|
Optical System |
Focal Length |
300mm |
|
Wavelength range |
165nm-580nm(extendable) |
|
|
Detector |
High resolution CMOS Multi detectors |
|
|
Optical chamber |
Argon cycle filling |
|
|
Pixel resolution |
30pm |
|
|
Grating line |
3600m1/mm |
|
|
First order spectral line dispersion rare |
1.2nm/mm |
|
|
Average resolution ratio |
10pm/pixel |
|
|
Full spectrum |
||
|
Optical chamber temperature is controlled automatically |
||
|
Spark Source |
Type |
Digital arc and spark source |
|
Spark frequency |
100-1000HZ |
|
|
Discharge current |
1-400A |
|
|
Ignition voltage |
>15000V |
|
|
Spark light |
Optimization of discharge parameters design |
|
|
High energy precombustion technology HEPS |
||
|
Processor |
High-speed data synchronization acquisition and processing |
|
|
Spark Stand |
Electrode |
Tungsten electrode technology |
|
Make up |
Thermal deformation self-compensation design |
|
|
Argon flushed with minimal consumption of Argon |
||
|
Spray discharge electrode technology |
||
|
Adjustable electrode technology |
||
|
Others |
Measurable elements |
Fe、Al、Cu、Ni、Ti、Co、Zn、Sn、Mg、Pb etc |
|
Dimension |
600mm(L)*370mm*450mm(H) |
|
|
Weight |
About 40kg |
|
|
Storage temperature |
0℃-45℃ |
|
|
Operating temperature |
10℃-35℃, 23±2℃ is recommended |
|
|
Power |
AC220V/50Hz(Customized) |
|
|
Power consumption |
Excitation:400W/Stand by:50W |
|
|
Argon quality |
99.999%, Argon pressure>4Mpa |
|
|
Argon consumption |
5L/min during spark mode |
|
|
Interface |
Ethernet data transmission based on DM9000A |
|
High resolution CMOS direct read out system
Save space with the smallest dimension and weight
High cost performance with excellent performance
Good determination of the different element in the various matrices
Operate a fast and accurate quantitative analysis
Argon flushed with minimal argon consumption
Complete automatic analysis software with diagnostic function
Simultaneous ICP-OES for elemental analysis of liquids
Wavelength range:195-800nm
For 70 trace elements and macroelements
Analyze up to 600 samples per day
Low operating costs
Intuitive operation
Ultra-low limits of detection
Ultra-high speed of measurement
Precisely measures the weight of the filter membrane before and after cleanliness extraction, thereby determining the weight of the particulate contaminants in the components.
Fast and non-destructive compliance screening
Outstanding sensitivity and detection limits
Remarkable precision and accuracy
Measure lower than ever
Master the unknown regardless if they are liquid, solid or powder
Whether tree leaves, plastics, oil, granite or glass…
Elemental range:Na-U
The Newest 2 in 1 Carbon& Sulfur Analysis Instrument
Carbon: 0.0001%～99.9999%
Sulfur: 0.0001%～99.9999%
High availability, low cost
Long service life, high stability
Unique analysis of gas removal device
Full scale linear calibration
Constant temperature of high-temperature furnace
Carbon monoxide conversion
Weak signal detection technology
Key Applications: Mainly used in steel, iron, alloy, casting core sand, nonferrous metals
Accurate, Fast, Non-Destructive, Straightforward, Environmentally Protective
For the elements in the range of Na-U
Halogen-free testing, ROHS/ELV testing
Coating thickness measurement
Identification of jewelry, precious stones, precious metals
Master the unknown material
Outstanding sensitivity leads to up to a factor 3 improved precision
Low measurement cost, easy to operate
Oxygen: 0.00005%～0.1%
Nitrogen: 0.00005%～0.5%
Hydrogen: 0.00005%～0.0050%
Optimized with user-friendly features
Highest Reliability and Economics
Precise and efficient element analysis
Quick results thanks to easy operation
Powerful furnace technology and new sample port system
Oxygen measurement cells with flexible measuring range
Because polishing is such a critical step in sample preparation, it’s important to choose a high quality polishing cloth. Our metallographic polishing cloth pads are thoroughly testedto provide a complete solution that delivers reliable results for each sample processed.
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